Influence of Synchronized Pulsed-bias on Microstructure and Properties of CrSiN Films Deposited at Low Temperature

The work aims to achieve the controlling preparation of high-performance CrSiN films at low deposition temperature, the HiPIMS technique was utilized to prepare CrSiN nano-composite films by regulating the synchronized pulsed-bias. The effects of the synchronized pulsed-bias on the microstructure, mechanics, tribology and corrosion resistance of films deposited at low temperature were studied. With the increase of the synchronized pulsed-bias, the content of light elements decreased slightly, which can be attributed to the energetic bombardment of the ions as well as the "re-sputtering effect" on the film growing surface. Meanwhile, the diffraction peak of c-CrN（111） disappeared and the preferred orientation of c-CrN（200） can be obtained. Due to the grain refinement and films density increase, the mechanical and corrosion resistance properties improved significantly. The film deposited at −500 V bias has maximum hardness of 16.5 GPa and minimum I_corr of 2.09×10⁻¹⁰ A/cm². Under high speed and room temperature tribological situation, the abrasive and adhesive wear were the major wear mechanism for the CrSiN films. The study achieved the controlling preparation of the CrSiN films with excellent corrosion resistance properties at low temperature by utilizing the synchronized pulsed-bias, which provides the new study ideas as well as the solution ways for broadening applications of CrSiN films on the thermal sensitive matrix.