LIN Y C,LIANG S,DAI W,et al. Preparation and properties of w-doped diamond-like carbon films by unbalanced magnetron sputtering[J]. Vacuum and Cryogenics,2024,30(2):112−118. DOI: 10.12446/j.issn.1006-7086.2024.02.002
Citation: LIN Y C,LIANG S,DAI W,et al. Preparation and properties of w-doped diamond-like carbon films by unbalanced magnetron sputtering[J]. Vacuum and Cryogenics,2024,30(2):112−118. DOI: 10.12446/j.issn.1006-7086.2024.02.002

Preparation and Properties of W-doped Diamond-like Carbon Films by Unbalanced Magnetron Sputtering

  • In order to study the effect of W doping on the properties of diamond-like carbon films, five groups of hydrogenated diamond-like carbon films(a-C:H:W) with different W atomic percentage (0% ~ 14% )were prepared on YG6 cemented carbide substrate by unbalanced magnetron sputtering method by changing the power of WC target. The surface morphology of the film was analyzed by scanning electron microscopy. The microstructure of the films was analyzed by Raman spectroscopy. The nano-hardness, adhesion and tribological properties of the film were characterized by nanoindenter , scratch tester and tribometer. The results show that the surface of a-C:H:W film is mound particles, with the increase of WC target power, the particle size decreases first and then increases, the degree of graphitization of the film increases with the increase of the doping amount, the critical scratch force Lc2 value of the film with 4% W doping atom percentage reaches 78.28 N, the wear rate is 5.8×10−8 mm3 / N · m, and the friction coefficient is 0.09.
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