INVESTIGATION IMPROVEMENT ACTIVATION OF GaN NEGATIVE ELECTRON AFFINITY PHOTO-CATHODES
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Graphical Abstract
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Abstract
Two to five micrometer thick P-AlxGa1-xN/GaN layers with 0<X≤0.4 were grown by low-pressure metal organic chemical Vapour deposition on sapphire(0001)substrates.For Al concentrations 0.2<X<0.7 in the AlxGa1-xN layers,The assessment of P-type GaN active layers Shows electron diffusion Lengths of 2 to 5 μm for a doping level of 3×1019cm-3。strcure model of energy bands for surface GaN-based phtocathode was and the result of experiment was satisfied with the model.
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