ZHANG Wei, MAN Wei-dong, TU Xin, et al. SUBSTRATES FOR CVD GROWTH OF GRAPHENE RESEARCH[J]. VACUUM AND CRYOGENICS, 2013, 19(4): 195-202,213. DOI: 10.3969/j.issn.1006-7086.2013.04.002
Citation: ZHANG Wei, MAN Wei-dong, TU Xin, et al. SUBSTRATES FOR CVD GROWTH OF GRAPHENE RESEARCH[J]. VACUUM AND CRYOGENICS, 2013, 19(4): 195-202,213. DOI: 10.3969/j.issn.1006-7086.2013.04.002

SUBSTRATES FOR CVD GROWTH OF GRAPHENE RESEARCH

  • Graphene has a unique structure and excellent properties. It has broad application prospects in electronics,information,energy,materials and biomedicine and other fields. For a better application of this new material,how large qualitycontrolled synthesis of grapheme is a necessary overcome difficulties. Compared with the mechanical exfoliation,chemical oxidation-reduction and epitaxial growth on SiC,chemical vapor deposition(CVD) method has been receiving significant attention because of it can grow high-quality large-area grapheme films. Based on the growth mechanism of grapheme,the recent substrates for CVD growth of grapheme research from the perspective of the substrate material is reviewed. Finally,the development of new trends in substrate selection are prospected.
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