STUDY OF GRAPHENE PREPARED BY MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION

TU Xin; MAN Wei-dong; YOU Zhi-heng; YANG Shuo

doi:10.3969/j.issn.1006-7086.2014.02.001

TU Xin, MAN Wei-dong, YOU Zhi-heng, et al. STUDY OF GRAPHENE PREPARED BY MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION[J]. VACUUM AND CRYOGENICS, 2014, 20(2): 63-70,76. DOI: 10.3969/j.issn.1006-7086.2014.02.001

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STUDY OF GRAPHENE PREPARED BY MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION

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Due to its advantages by low-temperature growth,a widely selection of the substrate materials and easily doped,microwave plasma chemical vapor deposition(MPCVD)is the first choice of the grapheme prepration by large area、high speed、high quality.The several main CVD methods for synthesizing grapheme are compared.It found out that MPCVD has clear superiority.Then the study of graphene prepared by MPCVD is expatiated.Lastly the application of graphene prepared by MPCVD is introduced and also the development trend of graphene prepared by MPCVD is prospected.

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STUDY OF GRAPHENE PREPARED BY MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION

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