RESEARCH PROGRESS OF GRAPHENE PREPARED BY MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION

In recent years，microwave plasma chemical vapor deposition（MPCVD）has been developed as a new method to prepare graphene.With the advantages of low-temperature growth，a wide choice of substrate material，and doping easy，MPCVD gradually becomes the main method for preparation of high-quality graphene.Firstly，several main methods（micro-mechanical peeling，SiC epitaxial growth，chemical stripping，and chemical vapor deposition）for synthesizing graphene were analysed and compared with MPCVD，finding that MPCVD has clear superiority.Moreover，research progress of MPCVD graphene was overviewed.Lastly，the applications of MPCVD graphene were listed briefly and the development trend of it was previewed.