LOW TEMPERATURE DEPOSITION GRAPHENE ON NICKEL SUBSTRATE USING MPCVD

Graphene is a two-dimensional carbon material with excellent properties.Taking methane and hydrogen as gas sources，the growth of graphene films is implemented on a nickel substrate by MPCVD.The fraction of coverage and surface morphology of the prepared graphene films are observed by metallographic and atomic force microscopy（AFM），the layer numbers，quality and amorphous carbon content are analyzed by Raman spectroscopy.The results show that the ventilation of hydrogen has a significant etching effect on the carbon-carbon bond，causing voids and grain boundary defects；the increase of methane content can improve the coverage rate of the film，which also promotes the generation of amorphous carbon；the coverage rate is low when the atmosphere is relatively lower，and it increased significantly when the atmosphere is higher.