ZHANG Shuai, WU Zhi-jie, CHANG Jing-chun, et al. CLEANING TECHNOLOGY OF VACUUM ELECTRONIC DEVICES[J]. VACUUM AND CRYOGENICS, 2016, 22(1): 60-62. DOI: 10.3969/j.issn.1006-7086.2016.01.014
Citation: ZHANG Shuai, WU Zhi-jie, CHANG Jing-chun, et al. CLEANING TECHNOLOGY OF VACUUM ELECTRONIC DEVICES[J]. VACUUM AND CRYOGENICS, 2016, 22(1): 60-62. DOI: 10.3969/j.issn.1006-7086.2016.01.014

CLEANING TECHNOLOGY OF VACUUM ELECTRONIC DEVICES

  • The surface of the parts and components of the vacuum electronic devices need clean. In the process of manufacturing vacuum electronic devices,the influence of the oil and contamination on the electroplating,brazing and coating the attenuating material was investigated. The method of removing the oil and contamination in the process of manufacturing vacuum electronic devices was ultrasonic with degreasing agent. The cleaning technology of vacuum electronic devices was determined. In order to ensure the cleaning of the vacuum electronic devices,the process of cleaning the vacuum electronic devices was determined.
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