THE NEW APPLICATIONG OF RADIAL MOLECULAR PUMPS（RMP）ON ARC ION PLATING COATERS

This paper introduces the newly developed radial molecular pump(RMP). The theory of process optimization is based on the special pump curve. The pump process and the coating process were developed according to restricted diffusion pumps and the TMPs. After the RMP is developed,it can extend the process windows for arc ion plating coating. It is necessary to optimize the pump process and the coating process to make the coater performance better.