SHI Feng, WANG Hao, ZHU Hong-wei. PIC/MCC SIMULATION OF THE DYNAMIC PROCESS OF Ar GLOW DISCHARGE[J]. VACUUM AND CRYOGENICS, 2018, 24(3): 188-192. DOI: 10.3969/j.issn.1006-7086.2018.03.009
Citation: SHI Feng, WANG Hao, ZHU Hong-wei. PIC/MCC SIMULATION OF THE DYNAMIC PROCESS OF Ar GLOW DISCHARGE[J]. VACUUM AND CRYOGENICS, 2018, 24(3): 188-192. DOI: 10.3969/j.issn.1006-7086.2018.03.009

PIC/MCC SIMULATION OF THE DYNAMIC PROCESS OF Ar GLOW DISCHARGE

  • The glow discharge is more and more widely used in the microelectronics industry.In order to study the characteristics of steady plasma in DC glow discharge.The particle grid method(PIC method)combined with the Monte Carlo collision model(MCC method)is used to track the motion of charged particles.At the same time,considering the elastic collision ionization electrons and neutral particles,elastic and charge exchange ions and neutral particles collide,we got the simulation results of the electron ion DC glow discharge ionization process after reaching steady state distribution in phase space,the spatial variation of charged particles in discharge process speed,energy,and the statistical average of the particles in space electric potential and electric field intensity distribution.The simulation results are consistent with the experimental and theoretical,has certain directive significance to the experiment.
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