ZHANG Weixin, GONG Chunzhi, WEN Jiarui, et al. Preparation of TiCN Film by Multiple Micro-pulse High Power Magnetron Sputtering and Its Properties[J]. VACUUM AND CRYOGENICS, 2019, 25(2): 116-120. DOI: 10.3969/j.issn.1006-7086.2019.02.008
Citation: ZHANG Weixin, GONG Chunzhi, WEN Jiarui, et al. Preparation of TiCN Film by Multiple Micro-pulse High Power Magnetron Sputtering and Its Properties[J]. VACUUM AND CRYOGENICS, 2019, 25(2): 116-120. DOI: 10.3969/j.issn.1006-7086.2019.02.008

Preparation of TiCN Film by Multiple Micro-pulse High Power Magnetron Sputtering and Its Properties

  • The TiCN films were prepared by multiple micro-pulse high power magnetron sputtering technique.The HIPIMS work voltage was 430 V,the ignition pulse voltage was 750 V,and the ignition pulse number was 3 constantly.Influence of C2H2gas flow on the structure and properties of TiCN films was studied.Cross-section morphology,structure,friction and wear performance,electrochemical corrosion resistance were respectively characterized by SEM,Raman spectroscopy,ball-disk friction and wear tester and electrochemical analyzer.The results show that with the increase of C2H2 gas flow rate,the deposition rate of TiCN film increased and the friction coefficient firstly decreased.Moreover,the wear width first decreased and then increased and the corrosion resistance of TiCN film declined initially and then remain stable.When the C2H2of gas flow rate was 1.4 mL/min,the wear width was 80.4 μm.
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