Preparation and Performance of WO_x Anti-reflective Layer in W-W_xN-Based Photothermal Conversion Films

Photo thermal conversion films have promising applications in the fields of aviation,aerospace and solar renewable energy applications.In oder to prepare a new photothermal film materials with high efficiency solar absorption and low emissivity,the medium frequency reactive magnetron sputtering deposition method was used to improve the absorption performance of the photothermal film by introducing WO_x as the anti-reflection layer of the new photothermal film on the basis of preparing W/W-W_xN (H) /W-W_xN (L) photothermal conversion film.The optical properties,surface morphology,structural information and chemical composition are discussed in this parer.The experimental results show that the WO_x anti-reflective layer contains various oxides of tungsten and exhibits an amorphous dense structure,and that this new photothermal conversion film has highly efficient photothermal performance parameters with an absorbance to emissivity ratio of 0.90/0.089.