INFLUENCES OF DEPOSITION PRESSURE ON MW—PCVD DIAMOND FILM

The diamond films were deposited in a quartz bell jar type microwave plasma chemical vapour deposition （MW—PCVD） research device. The influence of different deposition pressures on diamond film were characterized by scanning electron microscopy （SEM） and Raman spectroscopy. From the results it was found that increasment of deposition pressure was benefical to improving the quality of diamond films.