FIELD EMISSION PROPERTIES OF CARBON NANOTUBES FILMS SYNTHESIZED AT LOW TEMPERATURE

Ni catalyst was prepared by electrodepositing method on the glass substrate which was sputtered with Ti films,and synthesized CNTs films by microwave plasma chemical vapor deposition（MPCVD） technology at low temperature（450 ℃）,using CH₄ and H₂ as gas sources.CNTs’ films morphology and structure were examined by scanning electron microscopy（SEM） and Raman spectrum.The field emission properties of CNTs films were measured with a parallel diode-type configuration in a vacuum chamber with the pressure below 2×10^-4 Pa,the turn on field was about 2.7 V/μm.It proved that: It was possible to synthesize CNTs films by MPCVD technology at low temperature,the films which were synthesized under conditions have fine field emission properties.