THE DEVELOPMENT OF MAGNETRON REACTIVE SPUTTERING COATING EQUIPMENT FOR PREPARATION OF ITO FILM

CHANG Tianhai; JIANG Haocheng; ZHAO Guangping

CHANG Tianhai, JIANG Haocheng, ZHAO Guangping. THE DEVELOPMENT OF MAGNETRON REACTIVE SPUTTERING COATING EQUIPMENT FOR PREPARATION OF ITO FILM[J]. VACUUM AND CRYOGENICS, 1998, 4(3): 156-160.

Citation:

CHANG Tianhai, JIANG Haocheng, ZHAO Guangping. THE DEVELOPMENT OF MAGNETRON REACTIVE SPUTTERING COATING EQUIPMENT FOR PREPARATION OF ITO FILM[J]. VACUUM AND CRYOGENICS, 1998, 4(3): 156-160.

Citation:

CHANG Tianhai, JIANG Haocheng, ZHAO Guangping. THE DEVELOPMENT OF MAGNETRON REACTIVE SPUTTERING COATING EQUIPMENT FOR PREPARATION OF ITO FILM[J]. VACUUM AND CRYOGENICS, 1998, 4(3): 156-160.

THE DEVELOPMENT OF MAGNETRON REACTIVE SPUTTERING COATING EQUIPMENT FOR PREPARATION OF ITO FILM

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The design ruling on the key parts of the magnetron reactive sputtering coating equipment for preparation of ITO film has been introduced in the paper.The test results of the coating equipment have been given.

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THE DEVELOPMENT OF MAGNETRON REACTIVE SPUTTERING COATING EQUIPMENT FOR PREPARATION OF ITO FILM

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