DEVELOPMENT OF MWPCVD APPARATUS WITH WATERCOOLED CHAMBER FOR DIAMOND FILMS DEPOSITION

SHU Xing-sheng; WU Qin-chong

SHU Xing-sheng, WU Qin-chong. DEVELOPMENT OF MWPCVD APPARATUS WITH WATERCOOLED CHAMBER FOR DIAMOND FILMS DEPOSITION[J]. VACUUM AND CRYOGENICS, 2001, 7(1): 15-17,20.

Citation:

SHU Xing-sheng, WU Qin-chong. DEVELOPMENT OF MWPCVD APPARATUS WITH WATERCOOLED CHAMBER FOR DIAMOND FILMS DEPOSITION[J]. VACUUM AND CRYOGENICS, 2001, 7(1): 15-17,20.

Citation:

SHU Xing-sheng, WU Qin-chong. DEVELOPMENT OF MWPCVD APPARATUS WITH WATERCOOLED CHAMBER FOR DIAMOND FILMS DEPOSITION[J]. VACUUM AND CRYOGENICS, 2001, 7(1): 15-17,20.

DEVELOPMENT OF MWPCVD APPARATUS WITH WATERCOOLED CHAMBER FOR DIAMOND FILMS DEPOSITION

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Microwave plasma chemical vapor deposition（MWPCVD）is an important method for preparing diamond films. The reaction chamber-water-cooled MWPCVD apparatus for high rate and large-area deposition of diamond films has been successfully developed.It can steadily operate for a long time under the condition of 3.0 kW input microwave power.The diamond films have been successfully prepared on silicon substrates with this apparatus.

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DEVELOPMENT OF MWPCVD APPARATUS WITH WATERCOOLED CHAMBER FOR DIAMOND FILMS DEPOSITION

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