STUDY ON STRUCTURE AND MORPHOLOGY OF ZnO THIN FILMS PREPARED BY A NEW PROCESS

ZnO thin films were prepared by a new process thah includes two steps.Firstly,metallic Zn films were deposited by ion beam on Si（100） substrate.Secondly,ZnO thin films were fabricated by thermal oxidation of metallic Zn films.The structure and morphology of ZnO thin films were investigated and compared by XRD and AFM.The results show that the crystal orientation,roughness and dimension of the ZnO thin films are effected by the sputtering conditions of Zn films and thermal oxidation.After ZnO thin film was sputtered by ion beam again,its crystal orientation,roughness were changed too.