WORKING PRINCIPLE OF MICROWAVE PLASMA CVD SET UP

LU Qingao, WU Qinchong. WORKING PRINCIPLE OF MICROWAVE PLASMA CVD SET UP[J]. VACUUM AND CRYOGENICS, 1997, 3(2): 74-76.

Citation:

LU Qingao, WU Qinchong. WORKING PRINCIPLE OF MICROWAVE PLASMA CVD SET UP[J]. VACUUM AND CRYOGENICS, 1997, 3(2): 74-76.

Citation:

LU Qingao, WU Qinchong. WORKING PRINCIPLE OF MICROWAVE PLASMA CVD SET UP[J]. VACUUM AND CRYOGENICS, 1997, 3(2): 74-76.

Abstract

Microwave Plasma Chemical Vapor Deposition （MPCVD） is an important method for diamond film preparation.The microwave modes such as TE 10,TEM and TM ₀₁ in the microwave mode converter of the MPCVD set ups were measured in experiments.The initial phases of TEM and TM ₀₁ modes were given respectively.The coupling between microwave and plasma was described.5 kW antenna coupled MPCVD set up was developed in China for the first time.

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