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SU Xiaobao, WU Qinchong, WAN Yuanxi. THE EFFECT OF PRESSURE ON THE ARGON PLASMA CHARACTERIZATION[J]. VACUUM AND CRYOGENICS, 1997, 3(4): 187-191.
Citation: SU Xiaobao, WU Qinchong, WAN Yuanxi. THE EFFECT OF PRESSURE ON THE ARGON PLASMA CHARACTERIZATION[J]. VACUUM AND CRYOGENICS, 1997, 3(4): 187-191.
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THE EFFECT OF PRESSURE ON THE ARGON PLASMA CHARACTERIZATION

  • Institute of Plasma Physics, Academia Sinica, Hefei 230031

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  • Received Date: July 24, 1997
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  • A new large area microwave plasma source has been developed. The source consists of slots on the inner side which acts as a field applicatior to sustain a plasma. The plasma is contained in a Pyrex glass cylinder with an inner diameter of 30 cm and a height of 50 cm. The source has been used to study the effect of pressure on argon plasma parameters and microwave power for plasma ignition and extinction.
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