THE DESIGN AND CALCULATION OF MAGNETIC FIELD IN THE ROTARY COLUMN DOUBLE MAGNETRON SPUTTERING TARGET

A new rotary column double magnetron sputtering target is introduced.It has the advantage of the planar magnetron sputtering target.On the basis of its structure and operation principle,a kind of the math model and the calculating formula of the magnetic field strength of the target is presented.By the method,the calculation about the concrete target using the computer program has been finished and the distributied curve of the magnetic field of the target has been drawn too.The calculating results are given,the magnetic field of the rotary column double magnetron sputtering target is comparative even and the intensity can satisfy the need of the magnetron sputtering functions.The target etching angle is nearly 40°,so that the deposition rate is increased and the coating area is enhanced obviously.The homogeneity of the deposited films and the lifetime of the target,which are the general troubles with conventional cylinder magnetron sputtering target,have been greatly improved.A large area of homogeneous films can be deposited by the sides of the target.