DEVELOPMENT OF （TiAl）N ADVANCED FILMS BY PVD ARC PROCESS

LIU Quanshun, ZHANG Jingru, WANG Jinfa. DEVELOPMENT OF （TiAl）N ADVANCED FILMS BY PVD ARC PROCESS[J]. VACUUM AND CRYOGENICS, 1998, 4(2): 108-110.

Citation:

LIU Quanshun, ZHANG Jingru, WANG Jinfa. DEVELOPMENT OF （TiAl）N ADVANCED FILMS BY PVD ARC PROCESS[J]. VACUUM AND CRYOGENICS, 1998, 4(2): 108-110.

Citation:

LIU Quanshun, ZHANG Jingru, WANG Jinfa. DEVELOPMENT OF （TiAl）N ADVANCED FILMS BY PVD ARC PROCESS[J]. VACUUM AND CRYOGENICS, 1998, 4(2): 108-110.

Abstract

This paper reviews the characteristics of （TiAl）N advanced films by PVD arc process.The structure,composition and surface morphology of （TiAl）N films were studied.And the comparison between the performance of the cutting tools coated with TiN that coated with （TiAl）N is made.

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