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LIU Quanshun, ZHANG Jingru, WANG Jinfa. DEVELOPMENT OF （TiAl）N ADVANCED FILMS BY PVD ARC PROCESS[J]. VACUUM AND CRYOGENICS, 1998, 4(2): 108-110.
Citation: LIU Quanshun, ZHANG Jingru, WANG Jinfa. DEVELOPMENT OF （TiAl）N ADVANCED FILMS BY PVD ARC PROCESS[J]. VACUUM AND CRYOGENICS, 1998, 4(2): 108-110.
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DEVELOPMENT OF （TiAl）N ADVANCED FILMS BY PVD ARC PROCESS

  • Haerbin First Tool Factory, Haerbin 150020

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  • Received Date: December 24, 1997
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  • This paper reviews the characteristics of （TiAl）N advanced films by PVD arc process.The structure,composition and surface morphology of （TiAl）N films were studied.And the comparison between the performance of the cutting tools coated with TiN that coated with （TiAl）N is made.
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