MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION --A PROMISING TECHNIQUE FOR DIAMOND FILMS GROWTH

MAN Wei-dong; WANG Jian-hua; MA Zhi-bin; WANG Chuan-xin

MAN Wei-dong, WANG Jian-hua, MA Zhi-bin, et al. MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION --A PROMISING TECHNIQUE FOR DIAMOND FILMS GROWTH[J]. VACUUM AND CRYOGENICS, 2003, 9(1): 50-56.

Citation:

MAN Wei-dong, WANG Jian-hua, MA Zhi-bin, et al. MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION --A PROMISING TECHNIQUE FOR DIAMOND FILMS GROWTH[J]. VACUUM AND CRYOGENICS, 2003, 9(1): 50-56.

Citation:

MAN Wei-dong, WANG Jian-hua, MA Zhi-bin, et al. MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION --A PROMISING TECHNIQUE FOR DIAMOND FILMS GROWTH[J]. VACUUM AND CRYOGENICS, 2003, 9(1): 50-56.

MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION --A PROMISING TECHNIQUE FOR DIAMOND FILMS GROWTH

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An overview on using microwave plasma chemical vapor deposition （MPCVD） for the growth of high quality diamond films was given. It shows that MPCVD is the first choice for high growth rate, high quality, and large area diamond films deposition. Main kinds of apparatus used in MPCVD for diamond films deposition are also concerned. The application prospects of diamond thin films were also summarized.

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MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION --A PROMISING TECHNIQUE FOR DIAMOND FILMS GROWTH

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