CVD DIAMOND FILMS DEPOSITED BY MICROWAVE PLASMA:EFFECT OF THE SUBSTRATE POSITION

Diamond is deposited by a home-made 5 kW microwave plasma CVD rector with an input microwave power of 3.5 kW at a gas pressure of 12.0 kPa using H₂/CH₄/O₂ gas mixtures. Effects of different deposition position were compared. Surface morphology as well as the quality of the deposition were examined. The results indicate that high quality diamond film can be obtained if the substrate was set at the edge of plasma ball.