NEW MICROWAVE PLASMA CVD SET UP FOR DIAMOND FILM GROWTH

LU Qingao, WU Qinchong, SUI Yifeng, et al. NEW MICROWAVE PLASMA CVD SET UP FOR DIAMOND FILM GROWTH[J]. VACUUM AND CRYOGENICS, 1998, 4(1): 35-37.

Citation:

LU Qingao, WU Qinchong, SUI Yifeng, et al. NEW MICROWAVE PLASMA CVD SET UP FOR DIAMOND FILM GROWTH[J]. VACUUM AND CRYOGENICS, 1998, 4(1): 35-37.

Citation:

LU Qingao, WU Qinchong, SUI Yifeng, et al. NEW MICROWAVE PLASMA CVD SET UP FOR DIAMOND FILM GROWTH[J]. VACUUM AND CRYOGENICS, 1998, 4(1): 35-37.

Abstract

Microwave plasma chemical vapor deposition （MPCVD） is an important methed for diamond film preparation.5 kW antenna coupled MPCVD setup with a quartz vacuum window and water cooled stainless steel reaction chamber for higher depositing rate and lager depositing square was developed in China for the first time.Diamond films were prepared on silicon substrates with this set up.

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