DEPOSITION OF Ti_x Al_yN_z THERMAL CONTROL THIN FILMS BY MAGNETRON REACTIVE SPUTTERING

Ti_xAl_yN_z thermal control thin films were deposited on Al substrate by reactive mag netron sputtering tech-nique,with Ti and Al as targets.Ar and N₂ were used as sputtering gases.The effect of each factor on the structure of Ti_xAl_yN_z thin films was investigated to obtain the optimum conditions for deposition.X -ray diffraction（XRD）,X -ray photoelectron spectroscopy（XPS）have been used for characterizing the deposited films.Thermal and optic al test was processed for the thin films,which validated the thermal control characterization forTi_xAl_yN_z thin films.The research show that Ti_xAl_yN_z thermal control thin films can be deposited by reactive magnetron sputtering technique with independent Ti 、Al targets by controlling thickness and composition of films.Neglecting internal heat contribut ions,equilibrium temperature of 34℃was obtained.