STUDY OF MAGNETRON SPUTTERING ANTI RUST MoS<sub>2</sub> THIN FILMS DEPOSITION TECHNOLOGY

CHEN Dao; GUO Den-gzhu; WAN Zhi-hua; BAI Zhi-fang

CHEN Dao, GUO Den-gzhu, WAN Zhi-hua, et al. STUDY OF MAGNETRON SPUTTERING ANTI RUST MoS2 THIN FILMS DEPOSITION TECHNOLOGY[J]. VACUUM AND CRYOGENICS, 2002, 8(4): 241-245.

Citation:

CHEN Dao, GUO Den-gzhu, WAN Zhi-hua, et al. STUDY OF MAGNETRON SPUTTERING ANTI RUST MoS2 THIN FILMS DEPOSITION TECHNOLOGY[J]. VACUUM AND CRYOGENICS, 2002, 8(4): 241-245.

Citation:

CHEN Dao, GUO Den-gzhu, WAN Zhi-hua, et al. STUDY OF MAGNETRON SPUTTERING ANTI RUST MoS2 THIN FILMS DEPOSITION TECHNOLOGY[J]. VACUUM AND CRYOGENICS, 2002, 8(4): 241-245.

STUDY OF MAGNETRON SPUTTERING ANTI RUST MoS₂ THIN FILMS DEPOSITION TECHNOLOGY

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The depositon technology of magnetron sputtering anti rust MoS₂ thin films is introduced. The several factors that affected the properties of films are studied initially. The excellent anti rust MoS₂ thin film samples are prepared.

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STUDY OF MAGNETRON SPUTTERING ANTI RUST MoS2 THIN FILMS DEPOSITION TECHNOLOGY

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STUDY OF MAGNETRON SPUTTERING ANTI RUST MoS₂ THIN FILMS DEPOSITION TECHNOLOGY