STUDY ON THE HYSTERESIS EFFECT IN THE REACTIVE MAGNETRON SPUTTERING TECHNICS

The kinetic process of reactive magnetron sputtering has been studied. Theoretical analysis and experimental results have showed that the mutual relationships between flow rates and partial pressures of reactive gases exhibiting hysteresis effect, and optimum plating technics locate in its hysteresis region.The evaluating method of sputtering cleanout effect on metal target surface by volt-ampere characteristic of target cathode has been given,which provides effective approach to eliminate "target poisoning".