Diamond thin films grown up by microwave plasma CVD

An apparatus of microwave plasma CVD diamond thin film was costrcucted.It consists of microwave power,waveguide system,plasma depo-sition chamber,gas handling system,vacuum system and measuring system。The deposition chamber consists of a quartz tube 46 mm in diameter and 70 mm in height.The diamond films were deposited by gas mixture CH₄/H₂ and CO/H₂ separately in this system.We studied the effects of the deposition parameters on the diamond film and successfully deposited the films on single crystal silicon and quartz slices with 30 mm in diameter,It was found that the deposition rate was about 0.5~1.0μm/h with gas mixture of CH₄/H₂,which was similar to the hot filament CVD deposition system we had before.The deposition rate increased to 1.7um/h with gas mixture of CO/H₂,and the morphology of the coatings was better。