SU Xiaobao, WU Qinchong, WAN Yuanxi. CHARACTERIZATION OF THE IMPEDANCE OF ANNULAR WAVEGUIDE PLASMA SOURCE[J]. VACUUM AND CRYOGENICS, 1997, 3(4): 192-194.
Citation:
SU Xiaobao, WU Qinchong, WAN Yuanxi. CHARACTERIZATION OF THE IMPEDANCE OF ANNULAR WAVEGUIDE PLASMA SOURCE[J]. VACUUM AND CRYOGENICS, 1997, 3(4): 192-194.
SU Xiaobao, WU Qinchong, WAN Yuanxi. CHARACTERIZATION OF THE IMPEDANCE OF ANNULAR WAVEGUIDE PLASMA SOURCE[J]. VACUUM AND CRYOGENICS, 1997, 3(4): 192-194.
Citation:
SU Xiaobao, WU Qinchong, WAN Yuanxi. CHARACTERIZATION OF THE IMPEDANCE OF ANNULAR WAVEGUIDE PLASMA SOURCE[J]. VACUUM AND CRYOGENICS, 1997, 3(4): 192-194.
CHARACTERIZATION OF THE IMPEDANCE OF ANNULAR WAVEGUIDE PLASMA SOURCE
A microwave three probe system has been used to study the changes of annular waveguide plasma source impedance with operational parameters.The characterization of mircrowave plasma source impedance has been analyzed.The method is useful to the study of microwave plasma characterization and the realization of fast impedance matching.
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