STUDY ON LOW PRESSURE PREPARED TiO<sub>2</sub> THIN FILM

WU Zhenghuang, WU Zhengming, LI Wenyi. STUDY ON LOW PRESSURE PREPARED TiO2 THIN FILM[J]. VACUUM AND CRYOGENICS, 1999, 5(3): 167-170.

Citation:

WU Zhenghuang, WU Zhengming, LI Wenyi. STUDY ON LOW PRESSURE PREPARED TiO2 THIN FILM[J]. VACUUM AND CRYOGENICS, 1999, 5(3): 167-170.

Citation:

WU Zhenghuang, WU Zhengming, LI Wenyi. STUDY ON LOW PRESSURE PREPARED TiO2 THIN FILM[J]. VACUUM AND CRYOGENICS, 1999, 5(3): 167-170.

STUDY ON LOW PRESSURE PREPARED TiO₂ THIN FILM

Abstract

In this paper,TiO₂ thin film prepared by LPCVD and the effect of O₂ and H₂O pressure change on the film deposited rate were studied,meanwhile TiO₂ thin film prepared in reaction kinetics was discussed.The theoretical basis for preparing quality TiO₂ thin film is established.

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