XIE Shuping, FAN Chuizhen. APPLICATION OF EVOLVING FACTOR ANALYSIS IN AES DEPTH PROFILES OF Ta2O5/Ta SAMPLE[J]. VACUUM AND CRYOGENICS, 1997, 3(3): 145-149.
Citation: XIE Shuping, FAN Chuizhen. APPLICATION OF EVOLVING FACTOR ANALYSIS IN AES DEPTH PROFILES OF Ta2O5/Ta SAMPLE[J]. VACUUM AND CRYOGENICS, 1997, 3(3): 145-149.

APPLICATION OF EVOLVING FACTOR ANALYSIS IN AES DEPTH PROFILES OF Ta2O5/Ta SAMPLE

  • In this paper,It is firstly used of evolving factor analysis(EFA) into analyzing AES depth profiles of Ta2O5/Ta sample.It found three different chemical states of tantalum which were Ta,Ta2O5and TaO x, and discovered that,the film would decompose and produce unstable TaOx component when Ta2O5 film was being sputtered by Ar + ion. x value was 1.6 and atomic concentration was about to 40%,but no tantalum emerged in Ta2O5 during profiling.
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