A RFDIRECT CURRENT PLASMAENHANCED CVD INSTRUMENT

CHEN Jianguo, CHENG Yuhang, WU Yiping, et al. A RFDIRECT CURRENT PLASMAENHANCED CVD INSTRUMENT[J]. VACUUM AND CRYOGENICS, 1998, 4(1): 30-34.

Citation:

CHEN Jianguo, CHENG Yuhang, WU Yiping, et al. A RFDIRECT CURRENT PLASMAENHANCED CVD INSTRUMENT[J]. VACUUM AND CRYOGENICS, 1998, 4(1): 30-34.

Citation:

CHEN Jianguo, CHENG Yuhang, WU Yiping, et al. A RFDIRECT CURRENT PLASMAENHANCED CVD INSTRUMENT[J]. VACUUM AND CRYOGENICS, 1998, 4(1): 30-34.

Abstract

A radio frequency direct current plasma enhanced chemical vapour deposition system was designed and made by the use of the advantage of radio frequency plasma enhanced chemical vapour deposition and direct current plasma enhanced chemical vapour deposition.Diamond like carbon film was deposited successfully.The deposition rate increases with the increasing of bias voltage pressure.

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