PREPARATION OF SiO<sub>2</sub> THERMAL CONTROL FILM

WANG Jie-bing, XU Min, LI Qiang-yong, et al. PREPARATION OF SiO2 THERMAL CONTROL FILM[J]. VACUUM AND CRYOGENICS, 2003, 9(2): 93-97.

Citation:

WANG Jie-bing, XU Min, LI Qiang-yong, et al. PREPARATION OF SiO2 THERMAL CONTROL FILM[J]. VACUUM AND CRYOGENICS, 2003, 9(2): 93-97.

Citation:

WANG Jie-bing, XU Min, LI Qiang-yong, et al. PREPARATION OF SiO2 THERMAL CONTROL FILM[J]. VACUUM AND CRYOGENICS, 2003, 9(2): 93-97.

PREPARATION OF SiO₂ THERMAL CONTROL FILM

Abstract

The different thickness and thermal emissivity SiO₂ films and ITO（Indium Tin Oxide） films were prepared respectively by ion beam sputtering process and DC magnetron sputtering process on quartz glass LY12 and surface material of satellite. The effect of film thickness on optical,thermal performance of film were studied. The compound films whose hot emissivity is 0.45 and solar reflectance is larger than 0.7 were prepared in surface material of satellite.

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