THE PROGRESS OF ELECTRON-BEAM LITHOGRAPHY TECHNOLOGY IN MICRO/NANO FABRICATION

CHEN Jiong-shu. THE PROGRESS OF ELECTRON-BEAM LITHOGRAPHY TECHNOLOGY IN MICRO/NANO FABRICATION[J]. VACUUM AND CRYOGENICS, 2007, 13(1): 6-15,24.

Citation:

CHEN Jiong-shu. THE PROGRESS OF ELECTRON-BEAM LITHOGRAPHY TECHNOLOGY IN MICRO/NANO FABRICATION[J]. VACUUM AND CRYOGENICS, 2007, 13(1): 6-15,24.

Citation:

CHEN Jiong-shu. THE PROGRESS OF ELECTRON-BEAM LITHOGRAPHY TECHNOLOGY IN MICRO/NANO FABRICATION[J]. VACUUM AND CRYOGENICS, 2007, 13(1): 6-15,24.

Abstract

Micro/nano fabrication is the dominant factor in increasing the number of components per chip and further shrinking the size of devices,while e-beam lithography is one of the best ways to produce nano-features.The recent development of Electron-beam lithography technology was summarized.

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