中国环流三号（HL-3）壁处理系统研制

Research and Development on Wall Conditions of HL-3

摘要: 托卡马克装置壁处理系统对获得高真空、洁净的器壁条件至关重要。介绍了中国环流三号（HL-3）装置真空系统中的壁处理各子系统设计及研制概况。分析了壁处理系统调试运行过程和特点，设计了烘烤系统和直流辉光清洗系统的运行方案。分别对烘烤系统、直流辉光清洗系统以及射频辅助直流辉光放电系统的首次运行结果进行了讨论。通过应用壁处理系统，配合真空抽气系统，HL-3装置真空系统运行达到预期目标，初始放电前装置最小压力达到2.4×10⁻⁶ Pa。

Abstract: Wall condition is very important for the ultra vaccum and clean wall in a Tokamak device. The research and development on wall condition subsystems in vacuum system of HL-3 have been introduced. The debugging process and characteristics of wall conditioning are described, and the operational scenarios of baking system and the Glow Discharge Cleaning （GDC） system are designed. The results of baking system, GDC system and radio frequency assisted GDC system are discussed, respectively. By using the developed wall conditioning and pumping system, the vacuum system of the HL-3 device has reached the expected goal. The minimum pressure is 2.4×10⁻⁶ Pa before first plasma.