Abstract: High Power Pulsed Magnetron Sputtering （HiPIMS） technique is a high-ionized Physical Vapor Deposition （PVD） technique, which utilizes high pulse peak powers and low pulse duty cycles during the magnetron sputtering process. It has merits of depositing coatings with smooth and dense microstructure, high coating-substrate adhesive strength, and improved properties, including better mechanical properties, oxidation resistance, corrosion resistance, brighter colors, etc. Therefore, the HiPIMS technique becomes the hot topic in the PVD coating research. In this manuscript, the core benefits and drawbacks of the HiPIMS technique are briefly summarized, especially on the good mechanical properties, low deposition rate and high residual stress. Improvements in the HiPIMS techniques are also reviewed, such as varying the HIPIMS pulse shape, superposition of other power pulses on HiPIMS pulses, synchronization of bias voltage on HIPIMS pulses, and addition of auxiliary devices to enhance plasma stability, etc. The up-to-date research progress on improving deposition efficiency and performances by hybridization with other sputtering and arc techniques is also presented, such as Direct Current Magnetron Sputtering （DCMS）, Radio Frequency Magnetron Sputtering （RFMS）, Medium Frequency Magnetron Sputtering （MFMS） and Arc Ion Plating （AIP）. Hybridizing HiPIMS with DCMS alleviated self-sputtering effects and enhanced coating deposition rates. The residual stresses are also decreased. Combining HiPIMS with RFMS compensated for low deposition rates and expanded target availability. Hybridizing HiPIMS with MFMS helped mitigate target poisoning issues and improve deposition rates and coating performance. Combining HiPIMS with AIP techniques effectively increased ionization rates and resulted in improved mechanical properties of coatings and suppressed HiPIMS target arcing. The application of hybrid HiPIMS techniques in hard coatings, wear resistant materials, functional coatings and devices and other fields is also discussed. Furthermore, a prospect for the future development of HiPIMS and its hybrid techniques is also discussed, especially on its pulse power and plasma development, future industrial application and interdisciplinary development.