基底偏压对TiAlN涂层微观结构及摩擦学性能影响

Effect of Bias Voltage on Microstructure and Mechanical Properties of TiAlN Coating

  • 摘要: 采用电弧离子镀技术,在氮气气氛中通过调节基体偏压控制涂层沉积粒子的能量,分别在−50 V、−100 V、−150 V偏压下制备了三组不同的TiAlN涂层样品。研究结果表明,TiAlN涂层为柱状结构,随着偏压增加,涂层组织结构越来越致密。XRD结果表明涂层为fcc-(Ti,Al)N晶相结构。随着偏压增加,TiAlN涂层硬度呈现先上升后降低的趋势,在偏压−100 V时硬度达到最大值32.1 GPa,这是晶粒细化等多因素共同作用的结果。涂层摩擦系数和磨损率则随着偏压的增大而增大,在−50 V偏压时,涂层的摩擦系数最小,为0.67;磨损率最小,为4.17×10−6 mm3/(N·m)。因此,通过调节偏压参数可调控涂层的力学性能和摩擦学性能,为解决硬质合金等基体的表面改性问题提供有效途径。

     

    Abstract: This study systematically investigates the influence of bias voltage on the microstructure and tribological performance of TiAlN coatings deposited via arc ion plating. Three distinct coating samples were synthesized under a nitrogen atmosphere by applying different substrate bias voltages: –50 V, –100 V, and –150 V. By adjusting the bias voltage, the energy of deposited ions was effectively controlled, thereby affecting the growth behavior and resulting properties of the coatings. The morphological features, elemental distribution, and chemical composition of the coatings were examined using field emission scanning electron microscopy (FE-SEM) coupled with energy dispersive spectroscopy (EDS). The cross-sectional images revealed a typical columnar growth structure for all coatings, with a noticeable increase in densification as the bias voltage was elevated, which could be attributed to the enhanced ion bombardment effect that promoted adatom diffusion and reduced shadowing effects. X-ray diffraction (XRD) analysis indicated that all coatings maintained a single face-centered cubic (fcc) phase corresponding to (Ti, Al)N, without evidence of secondary phases, suggesting that the bias voltage within this range did not significantly alter the phase structure. Mechanical properties were assessed via nanoindentation tests, and the results showed that the hardness of the TiAlN coatings first increased and then decreased as the bias voltage rose from –50 V to –150 V. The maximum hardness of 32.1 GPa was achieved at –100 V, owing to a combination of factors including grain refinement, denser microstructure, and compressive stress introduction.Tribological properties were evaluated via ball-on-disk wear tests under dry sliding conditions. The results indicated that both the friction coefficient and the specific wear rate increased with higher bias voltages. The sample prepared at –50 V exhibited the best tribological performance, with a friction coefficient of 0.67 and a wear rate of 4.17×10−6 mm3/(N·m). This behavior was likely due to the reduced defect density and smoother morphology at lower bias voltages, which minimized abrasive wear and delamination. The findings underscore that optimizing substrate bias voltage provides an effective method for tailoring the mechanical and tribological properties of TiAlN coatings, offering valuable insights for enhancing the surface performance of carbide tools in demanding machining applications.

     

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