面向离子束抛光的聚焦型射频离子源研制

Development of a Focused RF Ion Source for Ion Beam Figuring

  • 摘要: 根据高精度光学制造的需求,成功研制出聚焦型射频离子源,突破了国内相关技术瓶颈。通过电磁场仿真优化线圈结构与磁场配置,采用5匝线圈与12根铝镍钴磁棒组成的环形永磁组件,显著提升等离子体密度与均匀性。基于分层架构与MVVM模式开发的控制系统,集成四大功能模块,实现工艺过程的稳定闭环控制。实验结果表明:离子源束径均值为8.37 mm,满足≤Φ10 mm设计要求;8 h连续运行中体积去除率波动仅为0.33%,远优于≤5%的指标要求,平均体积去除率达9.40×10−3 mm3/min,显著超过基准值。在高真空环境下,系统能稳定制备重复性良好的去除函数斑点,充分验证了其优异的长时运行稳定性与加工一致性。研究结果为高精度、高效率光学元件加工提供了可靠技术支撑,具有重要工程应用价值。

     

    Abstract: To address the critical requirements of high-precision optical manufacturing, a focused Radio-frequency(RF) ion source has been successfully developed, overcoming significant domestic technological barriers in this advanced field. Leveraging detailed electromagnetic field simulations, the coil structure and magnetic field configuration were meticulously optimized. This led to the adoption of an annular permanent magnet assembly consisting of 12 Alnico (Aluminum-Nickel-Cobalt) magnetic rods in conjunction with the 5-turn coils. This innovative design substantially enhances both the plasma density and its distribution uniformity, establishing a stable and controllable foundation for precise material removal essential in ultra-precision optics fabrication. In parallel, a dedicated control system was developed based on a layered software architecture and the Model-View-ViewModel(MVVM) design pattern. This system integrates four core functional modules—real-time process monitoring, parameter configuration, fault diagnosis, and data management which enables stable closed-loop control over the entire ion beam figuring process. This intelligent control framework ensures high repeatability, operational stability, and minimizes human intervention, which is crucial for achieving consistent machining outcomes. Comprehensive experimental validation confirms the system's outstanding performance. The average ion beam diameter measures 8.37 mm, fully complying with the ≤Φ10 mm design specification. During an extended 8-hour continuous operation test, the system demonstrated remarkable stability, with the fluctuation in volume removal rate recorded at a mere 0.33%, far surpassing the ≤5% performance benchmark. Moreover, the average volume removal rate achieved 9.40×10−3 mm3/min, significantly higher than the preset baseline value. Under high-vacuum conditions, the system consistently generated well-defined and highly repeatable removal function spots. These results robustly demonstrate its excellent long-term operational stability and superior machining consistency.In summary, this research provides a robust and reliable technical foundation for high-precision, high-efficiency optical component processing. The successful development of the focused RF ion source, together with the advanced control system, represents a substantial step forward in deterministic optical fabrication technology. The outcomes hold considerable engineering application value, offering a viable and promising solution for the manufacturing of next-generation high-performance optical systems, such as those used in aerospace, astronomy, and advanced lithography.

     

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