MPCVD法制备石墨烯的研究进展

RESEARCH PROGRESS OF GRAPHENE PREPARED BY MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION

摘要: 微波等离子体化学气相沉积（MPCVD）法是近年来发展起来的制备石墨烯的新方法，具有低温生长、基底材料选择广泛、容易掺杂等优点，逐渐成为制备高质量石墨烯的主要方法。首先通过分析制备石墨烯的几种主要方法（微机械剥离法、SiC外延生长法、化学剥离法、化学气相沉积法）得出MPCVD法相对于其他方法的优势，然后综述了MPCVD法制备石墨烯的研究进展，最后简要列举了MPCVD法制备的石墨烯的应用并对MPCVD法制备石墨烯的发展趋势进行了展望。

Abstract: In recent years，microwave plasma chemical vapor deposition（MPCVD）has been developed as a new method to prepare graphene.With the advantages of low-temperature growth，a wide choice of substrate material，and doping easy，MPCVD gradually becomes the main method for preparation of high-quality graphene.Firstly，several main methods（micro-mechanical peeling，SiC epitaxial growth，chemical stripping，and chemical vapor deposition）for synthesizing graphene were analysed and compared with MPCVD，finding that MPCVD has clear superiority.Moreover，research progress of MPCVD graphene was overviewed.Lastly，the applications of MPCVD graphene were listed briefly and the development trend of it was previewed.