徐嶺茂, 王济洲, 熊玉卿, 等. 倒圆锥面基底蒸发镀膜均匀性理论分析[J]. 真空与低温, 2014, 20(6): 340-343. DOI: 10.3969/j.issn.1006-7086.2014.06.008
引用本文: 徐嶺茂, 王济洲, 熊玉卿, 等. 倒圆锥面基底蒸发镀膜均匀性理论分析[J]. 真空与低温, 2014, 20(6): 340-343. DOI: 10.3969/j.issn.1006-7086.2014.06.008
XU Ling-mao, WANG Ji-zhou, XIONG Yu-qing, et al. THEORY STUDY OF FILM THICKNESS DISTRIBUTION ON INVERTED CONICAL SURFACE WITH THE EVAPORATION SOURCE UNDER SUBSTRATE[J]. VACUUM AND CRYOGENICS, 2014, 20(6): 340-343. DOI: 10.3969/j.issn.1006-7086.2014.06.008
Citation: XU Ling-mao, WANG Ji-zhou, XIONG Yu-qing, et al. THEORY STUDY OF FILM THICKNESS DISTRIBUTION ON INVERTED CONICAL SURFACE WITH THE EVAPORATION SOURCE UNDER SUBSTRATE[J]. VACUUM AND CRYOGENICS, 2014, 20(6): 340-343. DOI: 10.3969/j.issn.1006-7086.2014.06.008

倒圆锥面基底蒸发镀膜均匀性理论分析

THEORY STUDY OF FILM THICKNESS DISTRIBUTION ON INVERTED CONICAL SURFACE WITH THE EVAPORATION SOURCE UNDER SUBSTRATE

  • 摘要: 通过计算得出了蒸发源位于倒圆锥面正下方外部镀膜时锥面上各点的膜厚方程,并对整个锥面上膜厚均匀性进行了理论分析。结果表明:当圆锥面形状固定时,蒸发源与圆锥底圆圆心距离增大使锥面上膜厚均匀性变好;当蒸发源固定时,增大底圆半径导致锥面上膜厚均匀性变差。在同样的配置下,蒸发源为点源或小平面源时锥面上膜厚均匀性的变化趋势一致,小平面源蒸镀比点源蒸镀时圆锥面上膜厚均匀性差。

     

    Abstract: The theory study of film thickness distribution deposited on inverted conical surface with the evaporation source directly below the substrate is reported. The film thickness on every position of the cone and the film thickness uniformity of the cone can be received by calculation under different geometric configuration. The results show when the evaporation source is point source or small plane source and conical surface shape is fixed, the film thickness uniformity of cone becomes better as the distance of evaporation source and central of the cone bottom. And when the evaporation source is fixed, the increase of cone bottom radius results to film thickness uniformity of cone becomes worse. Under the same configuration, the thickness uniformity of cone with small plane source is worse than point source.

     

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