Abstract:
We have a study about the effects of O
2 on the growth of diamond films,and the diamond films were deposited by microwave plasma chemistry vapor deposition method using CH
4/H
2 gas mixture with different concentrations of O
2 addition.The surface morphology,quality and crystal structure of diamond films were systematically characterized by scanning electron microscopy(SEM),Raman spectroscopy and X-ray diffraction(XRD).When the O
2 concentration is in the range of 0~0.9%,the results show that with the increase of O
2 addition,the quality of the diamond films get much better.When the concentration of O
2 is increased to 0.9%,the quality of the diamond is the best,the impurity content is low,the diamond FWHM is 6.2 cm
-1 and the diamond has high crystal orientation in(111)plane.But when the concentration of O
2 is increased to 1.0%,the growth of diamond grain will be destroyed,even complete diamond films can’t be deposited.