高气压不同碳源浓度对纳米金刚石薄膜生长影响研究

THE STUDY FOR THE EFFECT OF HIGH PRESSURE AND DIFFERENCE CONCENTRATION OF CARBON ON NANODIAMOND FILM GROWTH

摘要: 利用微波等离子体气相沉积法，以氢气、氩气、甲烷为气源，在20～26 kPa，碳源浓度0.3%～1%条件下，通过改变气压与碳源浓度来制备纳米金刚石薄膜。运用Raman、SEM、XRD分别表征纳米金刚石薄膜的质量、表面形貌、晶粒大小。结果表明随着气压升高，沉积速率越快，薄膜质量先升高后降低。在一定气压范围内可以通过增大气压减少碳源浓度，能获得相对高质量的纳米金刚石薄膜。

Abstract: The influence of total gas pressure（20～26kPa）and methane concentration（0.3%～1%）on diamond growth using mixture gas of H₂/Ar/CH₄ source by microwave plasma chemical vapor deposition（MPCVD）was investigated.For a fixed methane concentration，characterization by Raman spectroscopy，scanning electron microscopy and X-ray diffraction indicated Characterization of nano diamond quality，surface morphology，grain size.The results show that growth rate increase with pressure increasing，but quality of nano-diamond films first become better then become worse while the pressure increases.Then using higher pressure and litter methane concentration could gain highly quality nanocrystalline diamond films.