石峰, 王昊, 朱红伟. 直流氩气辉光放电的PIC/MCC模拟分析[J]. 真空与低温, 2018, 24(3): 188-192. DOI: 10.3969/j.issn.1006-7086.2018.03.009
引用本文: 石峰, 王昊, 朱红伟. 直流氩气辉光放电的PIC/MCC模拟分析[J]. 真空与低温, 2018, 24(3): 188-192. DOI: 10.3969/j.issn.1006-7086.2018.03.009
SHI Feng, WANG Hao, ZHU Hong-wei. PIC/MCC SIMULATION OF THE DYNAMIC PROCESS OF Ar GLOW DISCHARGE[J]. VACUUM AND CRYOGENICS, 2018, 24(3): 188-192. DOI: 10.3969/j.issn.1006-7086.2018.03.009
Citation: SHI Feng, WANG Hao, ZHU Hong-wei. PIC/MCC SIMULATION OF THE DYNAMIC PROCESS OF Ar GLOW DISCHARGE[J]. VACUUM AND CRYOGENICS, 2018, 24(3): 188-192. DOI: 10.3969/j.issn.1006-7086.2018.03.009

直流氩气辉光放电的PIC/MCC模拟分析

PIC/MCC SIMULATION OF THE DYNAMIC PROCESS OF Ar GLOW DISCHARGE

  • 摘要: 辉光放电在微电子工业中的应用越来越广泛。为了研究直流辉光放电稳态等离子体的特性,采用粒子网格方法(PIC法)与Monte Carlo碰撞模型(MCC方法)相结合的方法(PIC/MCC方法)跟踪了带电粒子的运动过程,同时充分考虑了电子与中性粒子的弹性、电离碰撞,离子与中性粒子的弹性和电荷交换碰撞,模拟结果得到了直流辉光电离过程达到稳态后的电子离子的相空间分布,得到了放电过程中带电粒子的速度、能量的空间变化,同时对粒子进行统计平均,得到了空间中的电势和电场强度分布,模拟结果与实验和理论相符,对实验有一定的指导意义。

     

    Abstract: The glow discharge is more and more widely used in the microelectronics industry.In order to study the characteristics of steady plasma in DC glow discharge.The particle grid method(PIC method)combined with the Monte Carlo collision model(MCC method)is used to track the motion of charged particles.At the same time,considering the elastic collision ionization electrons and neutral particles,elastic and charge exchange ions and neutral particles collide,we got the simulation results of the electron ion DC glow discharge ionization process after reaching steady state distribution in phase space,the spatial variation of charged particles in discharge process speed,energy,and the statistical average of the particles in space electric potential and electric field intensity distribution.The simulation results are consistent with the experimental and theoretical,has certain directive significance to the experiment.

     

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