蒋钊, 唐德礼, 陈庆川, 等. 真空阴极电弧离子源磁场分析与设计[J]. 真空与低温, 2019, 25(3): 194-201. DOI: 10.3969/j.issn.1006-7086.2019.03.008
引用本文: 蒋钊, 唐德礼, 陈庆川, 等. 真空阴极电弧离子源磁场分析与设计[J]. 真空与低温, 2019, 25(3): 194-201. DOI: 10.3969/j.issn.1006-7086.2019.03.008
JIANG Zhao, TANG Deli, CHEN Qingchuan, et al. Magnetic Field Analysis and Design of Vacuum Cathode Arc Source[J]. VACUUM AND CRYOGENICS, 2019, 25(3): 194-201. DOI: 10.3969/j.issn.1006-7086.2019.03.008
Citation: JIANG Zhao, TANG Deli, CHEN Qingchuan, et al. Magnetic Field Analysis and Design of Vacuum Cathode Arc Source[J]. VACUUM AND CRYOGENICS, 2019, 25(3): 194-201. DOI: 10.3969/j.issn.1006-7086.2019.03.008

真空阴极电弧离子源磁场分析与设计

Magnetic Field Analysis and Design of Vacuum Cathode Arc Source

  • 摘要: 真空阴极电弧离子源是多弧离子镀膜设备的核心部件,直接影响镀膜系统的整体性能。真空阴极电弧离子源在工作时,大液滴发射是阻碍电弧离子镀技术广泛深入应用的瓶颈问题。合理设计并利用磁场可以很好地控制弧斑运动,大幅度地减少液滴、减小液滴尺寸、提高膜层质量和使用寿命。对真空阴极电弧离子源的附加磁场进行了理论分析和仿真计算,为附加磁场的优化设计提供了重要的指导依据。

     

    Abstract: Vacuum cathode arc source is one of the core parts in a vacuum arc deposition(VAD) rig,which directly influences the overall performance of the coating system.However,the macroparticles(MPs) formed in the working process of a vacuum cathode arc source are one critical obstacle for further expanding applications of VAD.By rational design and application of an external magnetic field,the cathode spots motion becomes controllable,the amount and sizes of detrimental droplets could be enormously reduced,which significantly improves coating quality,hence dramatically prolonged the service life.To obtain high reliability requested by large-scale VAD equipment,theoretical analyses and modelling of the vacuum cathode arc source with an external magnetic field were carried out and the results provide important guidelines on the optimization of VAD equipment.

     

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