王福贞. 阴极电弧离子镀膜技术的进步[J]. 真空与低温, 2020, 26(2): 87-95. DOI: 10.3969/j.issn.1006-7086.2020.02.001
引用本文: 王福贞. 阴极电弧离子镀膜技术的进步[J]. 真空与低温, 2020, 26(2): 87-95. DOI: 10.3969/j.issn.1006-7086.2020.02.001
WANG Fuzhen. Advances in Cathode Arc Ion Plating Technology[J]. VACUUM AND CRYOGENICS, 2020, 26(2): 87-95. DOI: 10.3969/j.issn.1006-7086.2020.02.001
Citation: WANG Fuzhen. Advances in Cathode Arc Ion Plating Technology[J]. VACUUM AND CRYOGENICS, 2020, 26(2): 87-95. DOI: 10.3969/j.issn.1006-7086.2020.02.001

阴极电弧离子镀膜技术的进步

Advances in Cathode Arc Ion Plating Technology

  • 摘要: 阴极电弧离子镀膜技术是国内外沉积工模具硬质膜层的主要技术。在高新技术产品和高端制造业需求的推动下,阴极电弧离子镀膜技术得到了长足的进步。本文介绍了阴极电弧离子镀膜技术的原理和特点,重点分析了阴极电弧源、硬质膜层性能和工件清洗技术等方面的进展,并对未来的发展进行了展望。

     

    Abstract: The technology of cathode arc ion plating is the main technology of hard coating for deposition tools.With the development of high-tech products and high-end manufacturing industry,cathode arc ion plating technology has been developed.The principle,characteristics and technical progress of various new cathode arc ion plating technologies are introduced.And the future development is prospected.

     

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