Preparation of Mo2C by MPCVD and Its Photocatalytic Properties
Preparation of Mo2C by MPCVD and Its Photocatalytic Properties
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摘要: Mo2C was prepared by microwave plasma chemical vapor deposition（MPCVD）technique with the power of 800 W and pressure of 18 kPa.Compared with traditional preparation methods，MPCVD has faster growth rate and higher purity of the products.The influence of growth time on the morphology and structure of Mo2C was characterized by X-ray diffraction and Scanning Electron Microscopy.The photocatalytic performance of Mo2C was tested.It was found that Mo2C had good photocatalytic performance and the 6 h sample had the highest photodegradation rate，indicating the great potential of Mo2C as photocatalyst.Abstract: Mo2C was prepared by microwave plasma chemical vapor deposition（MPCVD）technique with the power of 800 W and pressure of 18 kPa.Compared with traditional preparation methods，MPCVD has faster growth rate and higher purity of the products.The influence of growth time on the morphology and structure of Mo2C was characterized by X-ray diffraction and Scanning Electron Microscopy.The photocatalytic performance of Mo2C was tested.It was found that Mo2C had good photocatalytic performance and the 6 h sample had the highest photodegradation rate，indicating the great potential of Mo2C as photocatalyst.
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