王树正, 鄢强, 杜鸣皓, 等. 电弧离子镀弧源的研制进展[J]. 真空与低温, 2022, 28(2): 180-186. DOI: 10.3969/j.issn.1006-7086.2022.02.008
引用本文: 王树正, 鄢强, 杜鸣皓, 等. 电弧离子镀弧源的研制进展[J]. 真空与低温, 2022, 28(2): 180-186. DOI: 10.3969/j.issn.1006-7086.2022.02.008
WANG Shuzheng, YAN Qiang, DU Minghao, et al. Development of Arc Source in Arc Ion Plating[J]. VACUUM AND CRYOGENICS, 2022, 28(2): 180-186. DOI: 10.3969/j.issn.1006-7086.2022.02.008
Citation: WANG Shuzheng, YAN Qiang, DU Minghao, et al. Development of Arc Source in Arc Ion Plating[J]. VACUUM AND CRYOGENICS, 2022, 28(2): 180-186. DOI: 10.3969/j.issn.1006-7086.2022.02.008

电弧离子镀弧源的研制进展

Development of Arc Source in Arc Ion Plating

  • 摘要: 电弧离子镀作为一种经典的PVD技术已经在涂层领域得到了长足的发展,但沉积过程中产生的宏观大颗粒问题限制了其在纳米功能涂层中的应用。弧源作为电弧离子镀膜设备的核心部件,是宏观大颗粒产生的源头,直接决定镀膜系统的成膜质量。阐述了三类不同靶材形式传统弧源的特点,分析总结了近年来新型弧源研究和应用现状,综述了新型弧源在控弧磁场、水冷系统、辅助构件与引弧装置方面的创新,展望了未来弧源的设计发展趋势。

     

    Abstract: As a type of PVD technology,arc ion plating has been greatly developed in the coating field,but the mac-roparticles produced during the depositing process limit its application in the field of nano functional coatings.The arc source is the core component of arc ion coating equipment,and the source of macroparticles,which directly determines the film quality of the coating system.It is expounded the advantages and shortcomings of traditional arc sources,and fo-cused on several kinds of new arc sources mentioned in recent years,and summarized their innovations in arc magnetic field control,auxiliary components,water cooling system and arc initiation device,then discussed the future design of the arc source in this paper.

     

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