Abstract: A(BCSiAlCr) N_x films were deposited on the Si(100) wafer and 304 stainless steel using DC magnetron sputtering technology.XRD, XPS, TEM and SEM were used to analyze the composition, crystal structure and topography of the film, respectively.The corrosion resistance of the film was tested by electrochemical workstation, including potentio-dynamic polarization experiment, potentiostatic polarization experiment and impedance experiment.The experimental re-sults show that in 3.5% NaCl solution, compared with 304 stainless steel, HE3 film has the lowest corrosion current density(I_corr) of 0.031 1 μA/cm², and the highest corrosion potential of-37.557 mV.Meanwhile, in the corrosion resistance test of 0.5 mol/L sulfuric acid solution, HE3 film also has the lowest corrosion current density and the highest corrosion potential, showing the most excellent corrosion resistance.This is mainly due to the increase of nitrogen content in film, the amor-phous degree of film increases, the thin film becomes denser, surface defects and cavities disappear, which effectively im-proves the corrosion resistance of film.(BCSiAlCr) N_x films have potential application prospects in corrosion protection.