Mo<sub>2</sub>C过渡层对金刚石-碳膜场发射均匀性的影响

Mo₂C过渡层对金刚石-碳膜场发射均匀性的影响

摘要: 在经过不同特殊预处理的金属钼衬底上沉积了金刚石-碳膜,分别用X射线衍射谱(XRD)、拉曼光谱(Raman)和扫描电子显微镜(SEM)对样品进行了分析和测试,并研究了样品器件的场发射特性。结果发现在金属钼衬底和金刚石-碳膜之间形成的Mo₂C过渡层与金刚石-碳膜场发射均匀性有着密切的联系。

Abstract: The diamond -carbon films were deposited on metal Mo substrates by using microwave chemical vapor deposition（CVD）technique （Mo substrates were pretreated by special techniques）.The films were characterized by X-ray diffraction（XRD）,Raman spectrum and scanning electron microscopy（SEM）.The result of the experiments indicates that the Mo₂C interfacial layers formed between Mo substrate and the diamond-carbon films.The study demonstrated a strong correlation between the field emission uniformity and the Mo₂C interfacial layer.