化学气相沉积镀膜机控制研究

RESEARCH ON CONTROL OF CHEMICAL VAPOUR DEPOSIT COATING MACHINE

  • 摘要: 以RF-500型镀膜机为例介绍了化学气相沉积(CVD)镀膜机的结构以及工作原理;为克服RF-500型CVD镀膜机传统的电气控制缺点,开发了一套基于工业控制计算机的控制系统。描述了该镀膜机控制系统的硬件结构和软件功能。对基片温度、气体流量及开关量的控制效果进行了大量的实验研究。结果表明:基片温度控制精度达到±1℃、工作(反应)气体的流量控制精度达到10mL/min,可以进行精确的开关量控制。应用表明:该控制系统可以实时监控RF-500型CVD镀膜机的运行。

     

    Abstract: The paper introduces not only the hardware construction and software function of the RF-500 coating machine but also hardware composition and software architecture the new computer control system. A PC-based control system is developed for RF-500 chemical vapour deposit (CVD)coating machine in order to overcome shortcoming of traditional control manner. Lots of experiments are perform about substrate temperature, gas flow and swiching value aiming to obtain satisfactory control effect.The research resoults indicate that temperature control error ±1 ℃ is obtained and flow control error is 10 mL /min. The application indicates that the control system can real-time monitor performance of RF-500 CVD coating machine

     

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